We are proud to represent Bruker Nano, Inc., manufacturers of advanced semiconductor metrology systems.
FilmTek™ offers advanced metrology systems and analysis software to major companies in the semiconductor, optoelectronics, data storage, display, MEMS, and optical coating industries.
Our mission is to solve our clients’ most critical metrology challenges by providing leading-edge solutions to precisely suit their requirements. We value close cooperation and long-term partnership to understand and anticipate your current and future needs.
To meet these demands, our expanding technology suite of multi-modal metrology systems including patented DUV-NIR reflectometry with micro-spot measurement sizes. Our complete product portfolio serves our clients throughout the entire product life cycle, from research and development to high-volume production. We are dedicated to building custom solutions, as needed, to solve your specific requirements.
An extensive portfolio of key patents is held allowing for the highest index measurement accuracy in the industry, with a resolution 100 times better than existing tools. We continue to pioneer new technology in high-precision optical design and software modelling. Our technology is deployed in the world’s leading development and production facilities in a broad range of industries.
We can supply the following range of Bruker FilmTek™ systems for Reflectometry measurements offering small and micro-spot measurement capability.
Metrology system with a 50µm spot that delivers high-performance transmission and reflection measurement of patterned films deposited on transparent substrates. Ideally suited for measuring the thickness and optical constants of very thin absorbing films.
Micro-spot size metrology system developed for efficient and accurate measurement of patterned films deposited on transparent substrates. Allows for a spot size down to 2 µm, and can be equipped with a large custom stage for flat panel display applications.
Delivers efficient and accurate transmission and reflection measurement of unpatterned films deposited on transparent substrates. Ideally suited for measuring the thickness and optical constants of very thin absorbing films. Configured with large-scale automated stage for flat panel display applications.